Lithography tools

The CNL has a full range of lithography tools available. The Suss aligners provide contact alignment down to feature size of 1 micron. For smaller features there is a SEM with E-beam writing capability available.
The maskaligners are setup differently.

• Heidelberg DWL 66FS
• IMP Maskless Lithography system SF-100 XPRESS
• Suss MJB4 maskaligner
• Suss MJB3 maskaligner I setup for training and general use
• Suss MJB3 maskaligner II with front-to-back alignment
• Suss MJB3 maskaligner III with with splitfield microscope for easy alignment on 2" or 3" wafers.(Splitfield distance fixed at xx mm)
• Jeol SEM JSM-5910LV with E-beam writing capability

Please visit the CNL User pages for more details on these facilities (requires login)